Data Storage Media

Magnetic tape storage media with high capacity and long-term archivability

This storage media uses barium ferrite (BaFe) which maintains the necessary magnetic properties even when micronized and which provides a long-term archival life as well as low-noise and frequency characteristics that are superior to metal magnetic materials. The potential for a recording capacity of 220TB has been verified for cases where the particles are micronized with original Fujifilm technology and a magnetic layer is evenly applied and spread.

NANOCUBIC technology

BaFe magnetic materials are micronized to 1600 nm3. The resulting surface recording density of 29.5 Gbpsi contributes to the expansion of data cartridge recording capacities.

FUNDAMENTAL

  • Material Chemistry
  • Fujifilm Original

Processless Thermal CTP Plate XZ-R

Achieves excellent environmental performance without using a developer, while demonstrating high quality performance

True processless CTP requiring no need of alkali development and gum cleaning has been realized. It contributes to environmental load reduction by eliminating the cost for chemicals and waste disposal. Plates can be set on the press immediately after a high-speed exposure with the thermal CTP setter.

FPD technology and RSS technology

By spreading special minute particles on the photosensitive layer, FPD (Fine Particle Dispersion) technology makes it possible to simultaneously realize excellent image forming performance and image area strength. The use of RSS (Rapid Stable Start-up) enables rapid and stable image formation while realizing both of the conflicting qualities of image area strength and non-image area ease of removal.

FUNDAMENTAL

  • Material Chemistry
  • Imaging

instax

Instant photographic system with unique features which generates a print right on the spot when a photo is taken

When the impulse strikes, you can take the picture and immediately print it with this instant photographic system. Right after a photo is taken with instax, the developer spreads on the film and the color dies exposed to the light are released to be fixed on the image receiving layer, creating an image. This is Fujifilm’s exclusive original technology for on-the-spot photo printing.

Totally integrated photographic system

The 10 μm thick film contains 18 photosensitive and dye releasing layers. The film also has an image receiving layer, developer pod and development control layer, which are necessary for exposure to light, development and formation of image, making instax the ultimate photographic system.

FUNDAMENTAL

  • Material Chemistry
  • Imaging
  • Optics
  • Unique in the World

ArF immersion / topcoat-less photoresist (Materials for Semiconductor Manufacturing Process)

From hydrophobic to hydrophilic: a photoresist that does not need a topcoat, realized by polarity-conversion technology

Through the use of polarity-conversion technology, the resist surface that is hydrophobic (water repelling) at exposure time is changed to hydrophilic (water friendly) at development time. This eliminates the need for the topcoat used to prevent the wafer-constituent water dissolution that occurs at exposure time.

ArF immersion process

A technology for increasing the resolution by filling the space between the stepper lens and the wafer with water that has a higher refractive index than air. This makes micro-processing possible without changing the light source or the photomask.

FUNDAMENTAL

  • Material Chemistry
  • Optics
  • Fujifilm Original

NTI photoresist (Materials for Semiconductor Manufacturing Process)

Using a negative image formation method, this photoresist realized a revolutionary level of circuit pattern miniaturization

This technology introduces a negative image formation method in which the exposed portion remains on the silicon wafer. This makes it possible to produce circuit patterns at a level of fineness surpassing that of conventional positive developing, thus greatly contributing to higher semiconductor performance. Since sensitivity is high, shortening of takt time is also possible.

Negative image formation method

Since the area of the light passing through the photomask can be greater than in positive developing, even existing exposure systems can form finer patterns.

FUNDAMENTAL

  • Material Chemistry
  • Optics
  • Fujifilm Original