ISS (Irradiation Side Sampling) method

The main characteristic of Fujifilm's new proprietary technology “ISS method” is the placing of the TFT sensor on the front side of the scintillation layer whereas the TFT sensor of existing panels is located on the back side. By using this new method, the scattering/reduction of X-ray signals is significantly reduced (resulting in improved MTF). Also, optimization of the scintillation layer of the panel is achieved by Fujifilm's own precision coating technology cultivated by its vast experience in the manufacturing of Imaging Plates (IP), resulting in improved DQE.