Post CMP CleanersNEW
FUJIFILM Electronic Materials Post CMP slurries are designed to clean particles, trace metal and organic residues while protecting the metal surface.
Market-leading cleaner are available to meet a broad range process and technology requirements.
- Efficient particle removal
- Excellent organic cleanability
- Outstanding corrosion protection for sensitive metal features
- Attractive cost of ownership – concentrated cleaners provide lower cost at point-of-use
Available Copper Post CMP Cleaner:
- Removes particles and metallic impurities
- Eliminates organic residues
- Acidic chemistry
Available Tungsten Post CMP Cleaner:
- Removes particles without damaging metallic films
- Inhibits tungsten corrosion
- Neutral solution