Fujifilm Participates in “SEMICON India 2025”

TOKYO, August 27, 2025 – FUJIFILM Corporation will participate in “SEMICON India 2025”, an international exhibition of semiconductor manufacturing equipment and materials, to be held in New Delhi, India, from September 2 to 4, 2025.

India’s semiconductor-related market is projected to surpass $100 billion by 2030^*1–nearly quadrupling its 2019 size–driven by strong government initiatives to foster industry growth.
Fujifilm offers semiconductor materials used in wafer processing to post processing in semiconductor manufacturing including photoresists^*2, photolithography-related materials^*3, CMP slurries^*4, post-CMP cleaners^*5, thin-film chemicals^*6, polyimides^*7and high-purity process chemicals^*8 as well as WAVE CONTROL MOSAIC^™*9 which includes color filter materials for image sensor. Leveraging its strengths as a one-stop solution provider with a comprehensive product lineup spanning nearly the entire range of semiconductor manufacturing processes, Fujifilm is committed to supporting the rapid development of India’s semiconductor industry. By establishing a local semiconductor base for semiconductor materials manufacturing and building an integrated supply chain–from raw material procurement to product manufacturing– Fujifilm aims to contribute to the establishment of a robust semiconductor materials ecosystem in India.
Through its participation in SEMICON India, Fujifilm seeks to deepen engagement with customers and industry stakeholders, while building new partnerships to accelerate the expansion of its semiconductor materials business in India.

• *1 JETRO report “The Changing Global Semiconductor Ecosystem: Will India's Long-held Ambition to Become a Major Semiconductor Manufacturing Hub Be Realized?”
• *2 Material used to coat wafer substrate when circuit patterns are drawn in the process of semiconductor manufacturing.
• *3 Development solutions, cleaners and other materials used in the photolithography process of semiconductor manufacturing.
• *4 A proprietary formulation containing an abrasive that uniformly planarizes semiconductor surface, which contains a mixture of wires and insulation films of varying hardness.
• *5 Cleaners used after polishing with CMP slurry to remove particles, minute metal fragments and organic residues while protecting the metal surface.
• *6 Materials for forming low-dielectric insulation films.
• *7 A material with strong heat resistance and insulation properties, used for forming semiconductors’ protective films and redistribution layer.
• *8 High-purity chemicals used in the cleaning and drying processes. The chemicals are employed to remove contaminants during the cleaning and drying stages of semiconductor manufacturing, as well as to eliminate metals and oils during the etching process.
• *9 General term referring to a group of functional materials for controlling electromagnetic light waves in a broad range of wavelengths, including photosensitive color materials for manufacturing color filters for image sensors such as CMOS sensors, used in digital cameras and smartphones. WAVE CONTROL MOSAIC is a registered trademark or trademark of FUJIFILM Corporation.

• * Please note that the contents including the product availability, specification, prices and contacts in this website are current as of the date of the press announcement and may be subject to change without prior notice.