![](https://asset.fujifilm.com/www/cz/files/2020-02/27a9fce3a2979beff991011a78b4e97b/pic_02-negative.jpg)
Multiple series of negative tone, polyisoprene-based resist systems
ArF (193nm)
Materials for positive dry and immersion imaging, and negative tone development (NTD)
KrF (248nm)
Positive tone KrF photoresists covering a broad range of applications
i-Line, g-Line and Broadband
Extensive series of mid-uv sensitive photoresists for critical to non-critical applications encompassing sub-0.30µm to >1.0µm resolution.
e-Beam
Positive and negative tone resist series for a wide array of e-beam imaging applications