Denmark
Macro Silicon Wafer

i-Line, g-Line and Broadband

NEW

Extensive series of mid-uv sensitive photoresists for critical to non-critical applications encompassing sub-0.30µm to >1.0µm resolution.

Features & Benefits

Extensive series of mid-uv sensitive photoresists for critical to non-critical applications encompassing sub-0.30µm to >1.0µm resolution on varied substrates over a large range of resist thickness.

Product Summary

  • Advanced i-Line Resists for Non-reflective Substrates Resist families designed for demanding critical CD (<350 nm) printing on non-reflective substrates :
    • OiR 620 series
    • OiR 674 series
  • Advanced i-Line Resists for Reflective Substrates Resist series offering fast photospeed options for advanced resolution (>350 nm CD) patterning on reflective substrates :
    • OiR 674 series
    • GiR 1102 series
  • Multi-purpose High Resolution i-Line Resists Resist series offering fastest photospeed options for high throughput, high resolution (>500 nm CD) and robust patterning :
    • GIR 2700 Series
    • OiR 305 series
    • OiR 906 series
    • OiR 907 series
  • Multi-purpose Cross-over g- and i-Line Resists Resist series offering robust patterning for g-line, i-line and broadband (>800 nm CD) :
    • HiPR 6500 series
    • HPR 512
  • Dyed Resists for Highly Reflective Substrates Resist series offering non-bleaching, high optical densities for CD and notching control on highly reflective substrates :
    • OiR 906HD
    • OiR 305HC
    • HiPR 6517GH
  • i-Line Resists for Thicker Applications Resist series for thicker film patterning needs ranging from 3 to 11 µm film thickness :
    • FHi-560EP Series
    • FHi-570
    • OiR 305
    • OiR 908