Enabling the semiconductor
evolution.
FUJIFILM-shaping
the future with materials.
FUJIFILM will be exhibiting at SEMICON KOREA 2026.
Concept Video
Event Overview
- Date:February11(Wed) –13(Fri)
- Venue:COEX
MAP - Booth No. DS40
[Register to attend]
Exhibition Booth Overview
What “One-Stop Solution”
Means
-
1.Developing and supplying end to end materials
across the entire semiconductor
manufacturing process.
Delivering integrated solutions to
complex customer challenges
that can’t be solved by any single material alone.
Offering materials optimized for multiple
adjacent processes, all in one package. -
2.Providing optimal materials
for every type of semiconductor.
Providing a wide range of semiconductors including logic,
memory, image sensors, power semiconductors, and sensors.
To every challenge— a solution.
A Global Network
Close to Every Customer
A global network of production and R&D sites
Promoting next-generation process technology
and co-development of new products
with our customers.
Through a “local production for local consumption, local support”
framework,
we deliver solutions
precisely aligned with customer needs.
Product introduction
FFEM offers a wide product lineup covering
wafer processing to
advanced packaging
applications.
[Development of Current Products]
Leading the global CMP market with the best total
solution,
powered by expertise in polishing and cleaning.
- ・CMP Slurry
- ・pCMP Cleaner
- ・CMP for Hybrid Bonding
- ・CMP for Back End process
The Color Filter Materials with the world's largest market share for Image Sensors :
Go Beyond the
Limit of high Resolution, good Color Reproduction by New Technologies.
- ・WCM(Wave Control Mosaic®)
High Performance and High Quality Polyimide material, Resilient Supply Chain with Multiple Production Sites
- ・Liquid Type Polyimide : Low Temperature Cure, High Resolution, Good Mechanical Properties, Low Shrinkage, High Reliability
- ・Film Type Polyimide : Achieving an Excellent Planarity with Film Laminating Process
EUV NTD Resist Enabling High Resolution
- ・EUV Resist
- ・EUV Negative Tone Development System
[Solving Social Issues:Reducing Environmental Impact]
PFAS-Free Advanced Resist
- ・ArF
Nanoimprint Technology Enabling
nano-patterning with Low Energy consumption
- ・Nanoimprint Lithography Technology
Contact
Media Contact
FUJIFILM Holdings Corporation
Corporate Communications Division,
Public Relations Group
TEL:+81-3-6271-2000
Business Contact
FUJIFILM Corporation
Electronic Materials Business Division
E-mail:shm-ff-em_inquiries@fujifilm.com