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Semiconductor Materials

Photoresists

The photoresist product line encompasses a wide range of applications including broadband, g-line, i-line, 248nm, 193nm (dry and immersion), e-beam and EUV technology. The portfolio also includes a unique negative tone development resist system to address next generation needs, including double patterning.

Photoresist Ancillaries

A wide range of wet chemistries for the lithographic process
We offer a wide range of chemistries for the lithographic process including pre-wet, edge bead removal, cup rinse, development, photoresist stripping, removal and rinse

High Purity Primary Solvents

A leading manufacturer of high purity solvents used in semiconductor-related manufacturing processes

Cleaners and Etchants

A comprehensive range of specialty etchants, cleaners, removers and other ancillary products designed to compliment the FUJIFILM Electronic Materials photoresist and polyimide product lines.

CVD Precursors

A full range of ultra-pure CVD and thin film chemicals as well as high purity delivery systems designed to provide cost saving solutions and next generation technologies to the semiconductor industry.

CMP slurry & PCMP cleaner

To polish and planarize complex layers of integrated circuits

Wave Control Mosaic (Color Resist)

Color Mosaic for on-chip color filters image sensors and other optical applications.

Ancillaries
Polyimide and PBO

Materials for stress relief buffer coat or redistribution layer (RDL)