Fujifilm to Showcase “One-Stop Solutions” Approach at SEMICON West 2025

TOKYO, October 6, 2025 – FUJIFILM Corporation today announced that its U.S.-based subsidiary for semiconductor materials, FUJIFILM Electronic Materials U.S.A., Inc. (Fujifilm), will participate in “SEMICON West 2025”, an international exhibition of semiconductor manufacturing equipment and materials, to be held in Phoenix, Arizona, from October 7-9, 2025, where it will highlight its broad portfolio of advanced high-purity chemicals & semiconductor materials.

As an exhibitor, Fujifilm will showcase its wide range of semiconductor materials used in wafer processing in semiconductor manufacturing, including EUV, ArF, KrF, i-line, legacy, and new PFAS-free photoresists^*1, Chemical Mechanical Polishing (CMP) slurries^*2 and buffing cleaners, post-CMP cleaners^*3, process chemicals^*4 such as straight acids, bases, advanced formulated cleaners and selective etchants, TMAH developers, high purity lithographic ancillary solvents, IPA, blends and other solvents, thin film low-K dielectric precursors and TEOS, and associated precursor delivery equipment (Genstream^®), as well as advanced packaging materials such as its range of existing polyimide^*5 materials for protective coating and redistribution layer (RDL) insulation, advanced heat dissipation materials, and CMP slurry for advanced packaging.

Fujifilm is also expanding globally with products such as WAVE CONTROL MOSAIC^™*6, which includes color filter materials for image sensors.
Leaders will be available to discuss the company’s product development capabilities and robust service system tailored to the needs of advanced semiconductor manufacturing.
“SEMICON West is a vital platform for the entire semiconductor ecosystem to come together, and this year's theme of 'Stronger Together' deeply resonates with our vision of being a one-stop solution for semiconductor manufacturers,” noted Tetsuya Iwasaki, Director, Senior Vice President, and General Manager of the Electronic Materials Business Division, FUJIFILM Corporation, Japan. “At Fujifilm, we are committed to being a key partner in this process. Our latest investments and innovations are focused on accelerating the delivery of advanced materials that contribute to this shared goal, ensuring industry advancements.”
With 20 strategically located manufacturing sites across the United States, Europe, and Asia, Fujifilm ensures a resilient supply chain for its products that are vital to the ongoing operations of semiconductor manufacturing companies.
“Fujifilm is committed to local investment and technological development, accelerating the delivery of one-stop solutions that meet the diverse needs of its customers, and contributing to the further development of the semiconductor industry in the United States,” said Iwasaki.

Visit Fujifilm at SEMICON West, October 7-9, 2025, at the Phoenix Convention Center, Booth 677.

• *1 Material used to coat wafer substrate when circuit patterns are drawn in the process of semiconductor manufacturing.
• *2 A proprietary formulation containing an abrasive that uniformly planarizes semiconductor surface, which contains a mixture of wires and insulation films of varying hardness.
• *3 Cleaners used after polishing with CMP slurry to remove particles, minute metal fragments and organic residues while protecting the metal surface.
• *4 High-purity chemicals used in the cleaning and drying processes. The chemicals are employed to remove contaminants during the cleaning and drying stages of semiconductor manufacturing, as well as to eliminate metals and oils during the etching process.
• *5 A material with strong heat resistance and insulation properties, used for forming semiconductors’ protective films and redistribution layer.
• *6 General term referring to a group of functional materials for controlling electromagnetic light waves in a broad range of wavelengths, including photosensitive color materials for manufacturing color filters for image sensors such as CMOS sensors, used in digital cameras and smartphones. WAVE CONTROL MOSAIC is a registered trademark or trademark of FUJIFILM Corporation.

• * Please note that the contents including the product availability, specification, prices and contacts in this website are current as of the date of the press announcement and may be subject to change without prior notice.