In order to provide you with a better browsing experience and to improve our site functionality, we use cookies and other tracking technologies. Detailed information on the use of cookies on our site and how to opt out is provided in our Cookie Policy. By clicking into any content on this site, you consent that we can store and access cookies and other tracking technologies as described in our Cookie Policy.

silicon wafer


Comprehensive range of Metal Ion Containing (MIC) & Metal Ion Free (MIF) developers for positive and negative resist systems

FUJIFILM Electronic Materials provides a comprehensive range of metal ion free (MIF) photoresist developers suitable for immersion and in-line track development. 

In addition, metal ion containing (MIC) developers are available to those customers that continue to use this technology.

Features and Benefits

  • Proprietary multi-component formulations with surfactant additives
  • Packaging options : 
    • 4 x 4L bottles
    • 200L drums (one way and returnable)
    • 1000L IBC’s 
    • Bulk delivery

Product Summary

  • OPD 262 : developer without surfactant
  • OPD 4262 : developer with broadly applicable surfactant
  • OPD 4280 : developer with broadly applicable surfactant

Other alkalinities and surfactant families are also available.
Contact Us for more information 

  • WNRD : negative resist developer