- Nov 25, 2025
- Fujifilm Announces Completion of a New Building for Advanced Semiconductor Materials in Shizuoka
- Nov 18, 2025
- Fujifilm Receives “Most Valuable Partner Award” from Samsung Electronics
- Nov 12, 2025
- Fujifilm to Showcase “One-Stop Solutions” & European Manufacturing Strength at SEMICON Europa 2025
- Oct 6, 2025
- Fujifilm to Showcase “One-Stop Solutions” Approach at SEMICON West 2025
- Sep 29, 2025
- Fujifilm Launches Advanced Packaging CMP Slurry
- Sep 3, 2025
- Fujifilm Participates in “SEMICON Taiwan 2025”
- Aug 27, 2025
- Fujifilm Participates in “SEMICON India 2025”
- Jul 15, 2025
- Fujifilm Develops PFAS-Free Negative ArF Immersion Resist
- May 20, 2025
- Fujifilm to Showcase Cutting-Edge Back-End Process Materials at “ECTC 2025”
- Apr 17, 2025
- FUJIFILM Electronic Materials Earns Intel’s 2025 EPIC Supplier Award
- Feb 20, 2025
- Fujifilm to Present Latest Advanced Lithography Research at SPIE Advanced Lithography + Patterning 2025 Conference
- Feb 5, 2025
- Fujifilm to Invest 4 Billion yen in Belgium for CMP Slurries and Photolithography-related Materials
- Dec 5, 2024
- Fujifilm to Enhance its Production Capacity of Advanced Semiconductor Material CMP Slurries at the Kumamoto Site
- Nov 14, 2024
- Fujifilm Earns “Best in Value Award” from Samsung Electronics
- Oct 29, 2024
- Fujifilm Launches EUV Resist and EUV Developer
- Sep 30, 2024
- Fujifilm to Invest 20 Billion yen in Japan to Expand Semiconductor Materials Business
- Sep 3, 2024
- Fujifilm Participates in “SEMICON India 2024”, an International Exhibition of Semiconductor Manufacturing Equipment and Materials in India
- Jun 14, 2024
- Fujifilm Announces Completion of a New Factory for Advanced Semiconductor Materials in Korea
- Apr 30, 2024
- Fujifilm Launches Nanoimprint Resist Compatible with Nanoimprint Lithography
- Jan 25, 2024
- Fujifilm Starts Full-Scale Operation of its Production Facility for Basic Material Used in Semiconductor Manufacturing Process
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