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High Purity Primary Solvents

A leading manufacturer of high purity solvents used in semiconductor-related manufacturing processes.

Providing you solutions for today and tomorrow

FUJIFILM Ultra Pure Solutions, Inc. is one of the largest manufacturers of high purity chemicals in North America, serving the semiconductor, disk drive, flat panel, pharmaceutical, and bio-tech industries.

There are many advantages to working with FUJIFILM Ultra Pure Solutions, Inc. Our people have extensive knowledge and expertise to provide products to your exact specifications, when and where you need them, every time.

  • Redundant production sites provide “built in” disaster recovery
  • All manufacturing sites are ISO 9001:2008 certified
  • Ability to provide customer-specific variations in materials and testing
  • Our purification expertise allows us to provide high purity chemicals which are unobtainable elsewhere

Our Products

FUJIFILM Ultra Pure Solutions, Inc. has the knowledge and expertise to quickly adapt to any specification or customization you may need. We offer a broad range of solvents:

Ultra Pure Solvent Blends - Formulated chemistries which exhibit excellent solvency, with low volatility and odor.

Ultra Pure Solvent Blends for Photoresist Removal - Formulated chemistries for efficient photoresist removal without corrosion.

Ultra Pure Primary Solvents - Purification expertise to meet customer demands.

Partial Product List

#

  • 1-Butanol   
  • 2 Ethylhexanol 
  • 2-Butanol
  • 2-Ethylhexyl Acetate
  • 2-Nitropropane

A

  • Acetic Anhydride
  • Acetone  
  • Amyl Acetate (primary)
  • Amyl Alcohol (primary)
  • Aromatic 150
  • Aromatic 200

B

  • Butyl Amine
  • Butyl Carbitol

C

  • Cyclohexane 
  • Cyclohexanol 
  • Cyclohexanone 
  • Cyclohexylamine 
  • Cyclopentanone

D

  • DI Water
  • DI Water Blends
  • Diacetone Alcohol
  • Dibasic Ester Dibutyl Amine
  • Diethanolamine 
  • Diethyl Amine
  • Diethylene Glycol
  • Diethylene Triamine 
  • Diethylethanolamine 
  • Diisobutyl Ketone 
  • Diisopropanolamine 
  • Diisopropyl Amine
  • Dimethylamine 
  • Dimethylethanolamine 
  • Dipropylene Glycol
  • D-Limonene

E

  • Ester Solvent EEP
  • Ethanol (190 proof)
  • Ethanol (200 proof)
  • Ethanol Blends
  • Ethanol, 95%
  • Ethanol, Anhydrous
  • Ethanol, Denatured
  • Ethyl Lactate
  • Ethyl Propionate
  • Ethylene Glycol 
  • Ethylenediamine

G

  • Gamma Butyrolactone 
  • Glycerine

H

  • Heptane 
  • Hexane 
  • HMDS
  • Hydrogen Peroxide, Stabilized
  • Hydrogen Peroxide, Unstabilized 

I

  • IPA, USP 70% 
  • Isobutanol 
  • Isobutyl Acetate
  • Isobutyl Isobutyrate 
  • Isopar G
  • Isopropanol, Anhydrous
  • Isopropyl Acetate 99%
  • Isopropyl Alcohol 
  • Isopropyl Amine

M

  • Methanol 
  • Methyl Acetate
  • Methyl Amyl Ketone 
  • Methyl Ethyl Ketone 
  • Methyl Isoamyl Ketone 
  • Methyl Isobutyl Carbinol 
  • Methyl Isobutyl Ketone 
  • Methyl Propyl Ketone 
  • Methyl TEOS 
  • Monoethanolamine

N

  • n-Butyl Acetate 99%  
  • n-Butyl Lactate
  • n-Butyl Propionate
  • N-Methyl-2-Pyrrolidone 
  • n-Pentyl Propionate
  • n-Propanol  
  • n-Propyl Acetate

O

  • Odorless Mineral Spirits

P

  • Pentane
  • PGME 
  • PGMEA  
  • Propylene Glycol 
  • PTEOS

S

  • Solvent Blends

T

  • TEOS
  • Tetrahydrofuran 
  • TMAH Blends
  • Toluene  
  • Triethanolamin

X

  • Xylene

Our redundant production sites provide "built in" disaster recovery.