Netherlands
Metal Slurry in a beaker

Post CMP Cleaners

NEW

FUJIFILM Electronic Materials Post CMP slurries are designed to clean particles, trace metal and organic residues while protecting the metal surface.

Market-leading cleaner are available to meet a broad range process and technology requirements.

  • Efficient particle removal
  • Excellent organic cleanability
  • Outstanding corrosion protection for sensitive metal features
  • Attractive cost of ownership – concentrated cleaners provide lower cost at point-of-use

Available Copper Post CMP Cleaner:

  • CLEAN-100
    • Removes particles and metallic impurities
    • Eliminates organic residues
    • Acidic chemistry

Available Tungsten Post CMP Cleaner:

  • WCP-200
    • Removes particles without damaging metallic films
    • Inhibits tungsten corrosion
    • Neutral solution