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Home Business Semiconductor Materials Wave Control Mosaic™ (Color Resist) High n / Low n High n / Low n: Applications
Diagram describing product features. Applications are for image sensors, the spectrum is clear, the refractive index is 1.7 for high refractive materials at a wavelength of 550nm and 1.25 for low refractive materials at a wavelength of 550nm, and the environment-friendly materials are EHS-approved, and the packaging is a 0.76L quart glass bottle.

High n / Low n - Applications

Functional material with low refractive index for image sensor (IS) applications

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  • High n / Low n material of Wave Control Mosaic™ is designed for mega-pixel CMOS and CCD color sensors of digital still cameras, camcorders, security monitors, and other special image sensing devices available in the market today.
  • The excellent design of high / low refractive index make the device highly sensitive.
  • High n / Low n material of Wave Control Mosaic™ is fully compatible with existing coater-developers at semiconductor manufacturing sites.
High n / Low n material
Concept
High n
This is an image of an application example using a high refractive material. In the arrangement of green, red, white (clear), and blue pixels, it prevents light entering through the clear pixels from mixing with the red pixels.

High n clear pixel

Low n
This is an image of an application example using low-refraction materials. It shows an anti-reflective coating that prevents light from being reflected in the green pixels, and a grid structure that prevents light from entering the red pixels from the green pixels.

Anti Refl. Layer / Grid structure

Refractive index
High n
Graphical image of the refractive index of high refractive materials between 400 and 700 nm. It fluctuates between 1.8 and 1.7.
Low n
Graphical image of the refractive index of low-refraction materials between 400 and 700 nm. It fluctuates between 1.2 and 1.3.
Pattern view
High n
This is an image of a high refractive material that has been lithographically processed into 1.1μm pixels.

1.1μm pixel (by lithography)

Low n
Cross-sectional view of a grid structure in a low-refractive material that has been dry-etched.

Grid structure (by dry etching)

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