Fujifilm Completes Investment in Rapidus

TOKYO, February 27, 2026 – FUJIFILM Corporation announced that it has completed a 5 billion yen investment in Rapidus Corporation, a company aiming for the mass production of leading-edge logic semiconductors in Japan, following the execution of an investment agreement between the two companies.
Through this investment, Fujifilm is committed to realizing the domestic mass production of leading-edge semiconductors and to the development of Japan’s semiconductor industry. As a semiconductor materials manufacturer, Fujifilm will strongly support Rapidus’ development and manufacturing of leading-edge semiconductors by providing a wide range of semiconductor materials and technologies. In addition, by working closely with Rapidus on next-generation process development, Fujifilm will enhance its technological capabilities and accelerate the development of materials for next-generation semiconductors.

In recent years, the semiconductor market has grown rapidly due to the spread of AI, 5G and IoT, with particularly strong demand for advanced semiconductors such as AI semiconductors. Fujifilm’s semiconductor materials business has expanded its sales at an annual growth rate of approximately 20% from FY2021 to FY2024, becoming one of the core businesses driving the growth of the Fujifilm Group. By FY2030, Fujifilm aims to achieve sales of 500 billion yen, approximately double the level of FY2024. To support this growth, Fujifilm invested more than 100 billion yen in research and development and facilities from FY2021 to FY2024, and plans to invest an additional 100 billion yen or more from FY2025 to FY2026.
In Japan as well, Fujifilm has commenced operations of a new building for development and evaluation in November at its Shizuoka site, which serves as a core base for materials for advanced semiconductors such as advanced photoresists^*1, photolithography-related materials^*2 and polyimides^*3, and will also commence operations of a new building at its Oita site in FY2026 to expand production capacity for post-CMP cleaners^*4. Through its three manufacturing sites in Japan, including the Kumamoto site where a CMP slurry^*5 production line was launched in January 2024, Fujifilm will contribute to the development and production of Rapidus’ leading-edge semiconductors by promoting “local production for local consumption,” producing and supplying products close to customers, and “local support,” responding swiftly to customer challenges.
 

Fujifilm globally offers a wide range of semiconductor materials covering almost the entire semiconductor manufacturing process, from front-end to back-end processes. These include photoresists, photolithography-related materials, CMP slurries, post-CMP cleaners, thin-film materials^*6, photosensitive insulating materials such as polyimides marketed under the brand ZEMATESTM^*7, and high-purity process chemicals^*8. Fujifilm also provides Wave Control Mosaic™^*9, a group of functional materials including color filter materials for image sensors.
With its extensive product lineup covering semiconductor manufacturing processes from leading-edge to legacy nodes, a stable global supply structure with manufacturing sites in Japan, the United States, Europe and Asia, and strong research and development capabilities, Fujifilm provides one-stop solutions to address customer challenges and contributes to the development of the semiconductor industry.
 

• *1 Material used to coat wafer substrate when circuit patterns are drawn in the process of semiconductor manufacturing.
• *2 Development solutions, cleaners and other materials used in the photolithography process of semiconductor manufacturing.
• *3 A material with strong heat resistance and insulation properties, used for forming semiconductors’ protective films and rewiring layer.
• *4 Cleaners used after polishing with CMP slurry to remove particles, minute metal fragments and organic residues while protecting the metal surface.
• *5 A proprietary formulation containing an abrasive that uniformly planarizes semiconductor surface, which contains a mixture of wires and insulation films of varying hardness.
• *6 Materials for forming low-dielectric insulation films.
• *7 ZEMATES is a registered trademark or trademark of FUJIFILM Corporation.
• *8 High-purity chemicals used in the cleaning and drying processes. The chemicals are employed to remove contaminants during the cleaning and drying stages of semiconductor manufacturing, as well as to eliminate metals and oils during the etching process.
• *9 General term referring to a group of functional materials for controlling electromagnetic light waves in a broad range of wavelengths, including photosensitive color materials for manufacturing color filters for image sensors such as CMOS sensors, used in digital cameras and smartphones. WAVE CONTROL MOSAIC is a registered trademark or trademark of FUJIFILM Corporation.

• * Please note that the contents including the product availability, specification, prices and contacts in this website are current as of the date of the press announcement and may be subject to change without prior notice.