Black
NEWLight shielding and black matrix resists for image sensor (IS) and wafer level lens (WLL) applications
Light shielding and black matrix resists for image sensor (IS) and wafer level lens (WLL) applications
Features & Benefits
| Advantages | Processing with standard semiconductor equipment Thinner film thickness and good uniformity Low reflectance Small resolution down to 10um Excellent shielding performance for NIR(NCB) |
| Spectrum | Visible and near infrared (NIR) light sources |
| Transmittance | Non Carbon Black(NCB): Extremely low through 300-1800nm Color pigment based: Extremely low through 300-700nm |
| Exposure Dose | 50~2500mJ/cm2 (i-line) |
| Resistance | Excellent heat and light resistance |
| Environment | EHS approved raw materials |
| Packing | Quart glass bottle with 0.76L Gallon glass bottle with 2.89L |
Available Black product series
- Non Carbon Black (NCB)
- Color Pigment Based