France
Women working in lab wearing safety equipment

Emerging Metal Slurries

FUJIFILM Electronic Materials Cobalt CMP slurries are designed to polish cobalt and barrier metals and planarize all films in the circuits during advanced Cobalt interconnect polish.

Manufacturing Chain

FUJIFILM Electronic Materials Cobalt CMP slurries are designed to polish Cobalt and barrier metals. Slurries are developed to planarize Cobalt interconnect films