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Photoresist Ancillaries

A wide range of wet chemistries for the lithographic process

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Fujifilm’s family of Ultra-pure solvents for advanced lithography applications including, line cleaners, resist Edge Bead Removal (EBR), negative tone imaging, rinse, and pre-wet applications

Product Lineup

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NTI Developers

Broad range of specialty solvent blends for resist Edge Bead Removal (EBR), rework, rinse & pre-wet applications. Ultra-pure solvents for advanced lithography pre-wet applications
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Other Developers

Comprehensive range of Metal Ion Containing (MIC) & Metal Ion Free (MIF) developers for positive and negative resist systems
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Photoresist Strippers

Solvent based strippers for positive and negative tone photoresist removal
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