Positive and negative tone resist series for a wide array of e-beam imaging applications
Materials for positive dry and immersion imaging, and negative tone development (NTD)
Positive tone KrF photoresists covering a broad range of applications
i-Line, g-Line and Broadband
Extensive series of mid-uv sensitive photoresists for critical to non-critical applications encompassing sub-0.30µm to >1.0µm resolution.
Multiple series of negative tone, polyisoprene-based resist systems