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Home Business Semiconductor Materials Photoresists ArF (193nm)
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ArF (193nm) - Overview

Materials for positive dry and immersion imaging, and negative tone imaging (NTI)

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Product Lineup
  • GAR Series
    The products in the GAR series are suitable for a variety of applications that require 193nm dry exposure.
  • FAiRS Series for PTI (positive tone imaging)
    The products in the FAiRS series are suitable for a variety of applications that require 193nm immersion exposure and positive tone imaging.
  • FAiRS Series for NTI (negative tone imaging)
    The products in the FAiRS series are suitable for a variety of applications that require 193nm immersion exposure and negative tone imaging.
Features & Benefits

Wide array of high resolution imaging systems for 193 nm exposure including positive dry and immersion imaging and negative tone imaging (NTI)

  • High throughput
  • Superior resolution
  • Wide process windows
  • Low defect levels
  • Vertical profiles
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