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GKR series offers a wide lineup of products from high-thickness films to high-resolution products to meet the various requirements of customers.
- GKR-46xx/32xx series (for implant)
- GKR-53xx series (for C/H)
- GKR-63xx series (for L/S)
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Singapore
KrF (248nm) - Overview
Positive tone KrF photoresists covering a broad range of applications
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Leading supplier of photoresists offering a wide array of imaging products -
EUV (13.5nm)
EUV materials for negative tone imaging
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NIL (Nanoimprint Lithography)
NIL materials for semiconductor lithography process
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ArF (193nm)
Materials for positive dry and immersion imaging, and negative tone imaging (NTI)
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i-Line, g-Line and Broadband
Extensive series of mid-uv sensitive photoresists for critical to non-critical applications encompassing sub-0.30µm to >1.0µm resolution.
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Negative (Polyisoprene-based)
Multiple series of negative tone, polyisoprene-based resist systems
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e-Beam
Positive and negative tone resist series for a wide array of e-beam imaging applications
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