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Light shielding and black matrix resists for image sensor (IS) and wafer level lens (WLL) applications

Black material series of Color Mosaic® are negative tone imaging materials. These non-carbon high optical density (O.D) type materials have high shielding and low reflection performance for visible and NIR light blocking applications. Application examples are Image sensor, Black matrix, Optical black area use(Chip frame shielding), Shielding for chip backside, Wafer level lens, etc.