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Photoresist Ancillaries

A wide range of wet chemistries for the lithographic process

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We offer a wide range of chemistries for the lithographic process including pre-wet, edge bead removal, cup rinse, development, photoresist stripping, removal and rinse

Product Lineup

silicon wafer

Developers

Comprehensive range of Metal Ion Containing (MIC) & Metal Ion Free (MIF) developers for positive and negative resist systems
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Solvents

Broad range of specialty solvent blends for resist Edge Bead Removal (EBR), rework, rinse & pre-wet applications. Ultra-pure solvents for advanced lithography pre-wet applications
Liquid pouring from one beaker to another

Photoresist Strippers

Solvent based strippers for positive and negative tone photoresist removal
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