Taiwan
Photosensitive - Aqueous Developable - Applications
PBO based products designed and optimized for buffer coat and RDL
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Materials for stress relief buffer coat or redistribution layer -
Photosensitive - Solvent Developable
Designed for thick film capability, robust processing and with excellent mechanical properties
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Non-Photosensitive
Materials for low shrinkage, low temperature and lift off applications
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Ancillaries
Additional ancillary chemicals for use with our polyimide and PBO products
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