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Chemical delivery systems designed with an open architecture compatible to many chemistries
Our Genstream™ was carefully designed to be easy to use and maintain, and to provide value to your process. Being fully modular, our Genstream™ system solution can be uniquely tailored to address your specific process needs with minimum capital investment.
“Genstream™ " is a trademark of FUJIFILM Corporation registered in the United States and other countries and regions.
Advanced Low K
Advanced dielectrics for 45/22 nm node and below
Gap Fill and Recovery
Supporting chemistry for low K dielectrics
Dielectric and Dopant Sources
High purity precursors supported by state of the art analytical testing and production
Others
Chlorine sources, adhesion promoters, etchants, cleaners, reducers
Temperature Controller
Precision temperature control of your precursor with the ease of front loading
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