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Leading supplier of photoresists offering a wide array of imaging products

FUJIFILM Electronic Materials offers a wide range of advanced imaging products, to meet the needs of its customers around the world.

The photoresist product line encompasses a wide range of applications including broadband, g-line, i-line, 248nm, 193nm (dry and immersion), e-beam and EUV technology. The portfolio also includes a unique negative tone development resist system to address next generation needs, including double patterning.