United States

Black

NEW

Light shielding and black matrix resists for image sensor (IS) and wafer level lens (WLL) applications

Light shielding and black matrix resists for image sensor (IS) and wafer level lens (WLL) applications

Features & Benefits

Advantages Processing with standard semiconductor equipment
Thinner film thickness and good uniformity
Low reflectance
Small resolution down to 10um
Excellent shielding performance for NIR(NCB)
Spectrum Visible and near infrared (NIR) light sources
Transmittance Non Carbon Black(NCB):
Extremely low through 300-1800nm
Color pigment based:
Extremely low through 300-700nm
Exposure Dose 50~2500mJ/cm2 (i-line)
Resistance Excellent heat and light resistance
Environment EHS approved raw materials
Packing Quart glass bottle with 0.76L
Gallon glass bottle with 2.89L

 

Available Black product series

  • Non Carbon Black (NCB)
  • Color Pigment Based