United States
Home Business Semiconductor Materials Photoresist Ancillaries

Photoresist Ancillaries

A wide range of wet chemistries for the lithographic process

Contact Us

Fujifilm’s family of Ultra-pure solvents for advanced lithography applications including, line cleaners, resist Edge Bead Removal (EBR), negative tone imaging, rinse, and pre-wet applications

Product Lineup

Solvents Thumbnail

NTI Developers

Broad range of specialty solvent blends for resist Edge Bead Removal (EBR), rework, rinse & pre-wet applications. Ultra-pure solvents for advanced lithography pre-wet applications
silicon wafer

Other Developers

Comprehensive range of Metal Ion Containing (MIC) & Metal Ion Free (MIF) developers for positive and negative resist systems
Liquid pouring from one beaker to another

Photoresist Strippers

Solvent based strippers for positive and negative tone photoresist removal
Contact Us