Comprehensive range of Metal Ion Containing (MIC) & Metal Ion Free (MIF) developers for positive and negative resist systems
FUJIFILM Electronic Materials provides a comprehensive range of metal ion free (MIF) photoresist developers suitable for immersion and in-line track development.
In addition, metal ion containing (MIC) developers are available to those customers that continue to use this technology.
Features and Benefits
- Proprietary multi-component formulations with surfactant additives
- Packaging options :
- 4 x 4L bottles
- 200L drums (one way and returnable)
- 1000L IBC’s
- Bulk delivery
- OPD 262 : developer without surfactant
- OPD 4262 : developer with broadly applicable surfactant
- OPD 4280 : developer with broadly applicable surfactant
Other alkalinities and surfactant families are also available.
Contact Us for more information
- WNRD : negative resist developer