United States

Semiconductor Materials

Cleaners

NEW

Aqueous post ash residue cleaners on aluminum and copper alloys, anti-reflective layers, SiO2 and low-k dielectrics

Features & Benefits

  • Wide process latitude
  • Compatible with spray and batch tool applications
  • Compelling cost of ownership advantage over hydroxylamine (HA) solvent-based cleaners - Direct DI water rinse 
    • Eliminates IPA rinsing chemical cost
    • Increased throughput by eliminating IPA-rinse steps
  • Safe and easy to use
  • Excellent process equipment materials compatibility
  • Superior metals and ILD compatibility
  • Packaging options:
    • 4 L HDPE bottle
    • 200 L drum