Leading supplier of photoresists offering a wide array of imaging products
FUJIFILM Electronic Materials offers a wide range of advanced imaging products, to meet the needs of its customers around the world.
The photoresist product line encompasses a wide range of applications including broadband, g-line, i-line, 248nm, 193nm (dry and immersion), e-beam and EUV technology. The portfolio also includes a unique negative tone development resist system to address next generation needs, including double patterning.
i-Line, g-Line and Broadband
Extensive series of mid-uv sensitive photoresists for applications encompassing sub-0.30 µm to >1.0 µm resolution