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ArF (193nm)

NEW

Materials for positive dry and immersion imaging, and negative tone development (NTD)

Features & Benefits

Wide array of high resolution imaging systems for 193 nm exposure including positive dry and immersion imaging and negative tone development (NTD)

  • High throughput
  • Superior resolution
  • Wide process windows
  • Low defect levels
  • Vertical profiles

Product Summary

  • GAR series
    The GAR series of products are suited to work with a wide array of applications requiring 193nm dry exposure
  • FAiRS series for PTD
    The FAiRS series of products are suited to work with a wide array of applications requiring 193nm immersion exposure and positive tone development
  • FAiRS series for NTD
    The FAiRS series of products are suited to work with a wide array of applications requiring 193nm immersion exposure and negative tone development