United States
ArF (193nm) - Support
Materials for positive dry and immersion imaging, and negative tone imaging (NTI)
-
Leading supplier of photoresists offering a wide array of imaging products -
EUV (13.5nm)
EUV materials for negative tone imaging
-
NIL (Nanoimprint Lithography)
NIL materials for semiconductor lithography process
-
KrF (248nm)
Positive tone KrF photoresists covering a broad range of applications
-
i-Line, g-Line and Broadband
Extensive series of mid-uv sensitive photoresists for applications encompassing sub-0.30 µm to >1.0 µm resolution
-
Negative (Polyisoprene-based)
Multiple series of negative tone, polyisoprene-based resist systems
-
e-Beam
Positive and negative tone resist series for a wide array of e-beam imaging applications
-