United States

Front End CMP Slurries

NEW

FUJIFILM Electronic Materials Front End CMP slurries are designed for devices that utilize advanced transistor technologies such as high-K metal gates, advanced dielectrics, 3-dimensional FinFET transistors, and self-aligned contacts. Various product platforms are available to meet a broad range of process and technology requirements.

Manufacturing Chain

FUJIFILM Electronic Materials advanced Front End CMP slurries are designed for use in the critical early stages of device fabrication, removing materials in in a controlled manner to provide the ideal surface for subsequent steps in the production flow.