Post CMP CleanersNEW
FUJIFILM Electronic Materials Post CMP slurries are designed to clean particles, trace metal and organic residues while protecting the metal surface.
Market-leading cleaner are available to meet a broad range process and technology requirements.
- Efficient particle removal
- Excellent organic cleanability
- Outstanding corrosion protection for sensitive metal features
- Attractive cost of ownership – Concentrated cleaners provide lower cost at point-of-use
Available Copper Cleaner:
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