United States
Metal Slurry in a beaker

Post CMP Cleaners

NEW

FUJIFILM Electronic Materials Post CMP slurries are designed to clean particles, trace metal and organic residues while protecting the metal surface.

Market-leading cleaner are available to meet a broad range process and technology requirements.

    • Efficient particle removal
    • Excellent organic cleanability
    • Outstanding corrosion protection for sensitive metal features
    • Attractive cost of ownership – Concentrated cleaners provide lower cost at point-of-use

Available Copper Cleaner:
Clean-100

Contact Us for more information and a complete product overview